Reduction of Multiple Interference Effect for Lithography.

Reduction of Multiple Interference Effect for Lithography

To reduce critical dimension (CD) variation due to multiple interference effect, anti-reflective coatingl) and over coating processes2) have been proposed and investigated. In this paper, we discuss the problem of the over coating processes and report a new and simple process, called OCT (Optical-path Control Technique), for reducing the multiple interference effect that does not require new ma...

Interference Lithography

Interference lithography (IL) is the preferred method for fabricating periodic and quasi-periodic patterns that must be spatially coherent over large areas. IL is a conceptually simple process where two coherent beams interfere to produce a standing wave, which can be recorded in a photoresist. The spatial-period of the grating can be as fine as half the wavelength of the interfering light, all...

Interference Lithography for Patterned Media

the effect of consciousness raising (c-r) on the reduction of translational errors: a case study

در دوره های آموزش ترجمه استادان بیشتر سعی دارند دانشجویان را با انواع متون آشنا سازند، درحالی که کمتر به خطاهای مکرر آنان در متن ترجمه شده می پردازند. اهمیت تحقیق حاضر مبنی بر ارتکاب مکرر خطاهای ترجمانی حتی بعد از گذراندن دوره های تخصصی ترجمه از سوی دانشجویان است. هدف از آن تاکید بر خطاهای رایج میان دانشجویان مترجمی و کاهش این خطاها با افزایش آگاهی و هوشیاری دانشجویان از بروز آنها است.از آنجا ک...

Low-cost interference lithography

The authors report demonstration of a low-cost 1000 USD interference lithography system based on a Lloyd’s mirror interferometer that is capable of 300 nm pitch patterning. The components include only a 405 nm GaN diode-laser module, a machinist’s block, a chrome-coated silicon mirror, substrate, and double-sided carbon scanning electron microscopy SEM tape. The laser and the machinist’s block ...